MIMZY · № 19 · the future tool forge
There are three gaps hiding in the question. The band gap of silicon — 1.12 eV — is the real one. The dopants ride in it. And every element that touches the chip is collated below, by the role it plays around the lattice.
forge: MIMZY bench · geometry: № 18 the CMOS gap gate · the 118: ELEMENTS WORKSHOP
Silicon is a semiconductor because of a 1.12 eV forbidden band between the valence floor (Ev) and the conduction ceiling (Ec). A dopant works by parking an energy level inside that gap — donors a hair under the ceiling, acceptors a hair above the floor. Click a level to seat it.
Donors (n-type) sit just below Ec and spill an electron up into the conduction band. Acceptors (p-type) sit just above Ev and pull an electron up out of the valence band, leaving a hole. Deep traps sit mid-gap and kill carriers.
kT at 300 K is 25.9 meV — shallow levels (<~78 meV) ionise fully; indium (160) and the deep traps do not.
39 elements out of the 118 carry a real, citable job in mainstream silicon CMOS — as the substrate, the dopants, the gate, the wires, the strain, the gases, the light. Filter by role; click any lit cell.
39 riders are lit. The dark cells are along for nothing — they never touch the working silicon. Boron, carbon, cobalt and copper — four of David's own folders — ride.