Each layer contains a 10x10 sub-grid. Layers are connected via Ti vias that route photons vertically with propagation delay based on layer distance.
Via Thermal Resistance
Titanium vias introduce thermal bottlenecks. Thermal resistance per via scales with:
Rth = (L / (k * A)) * N_layers
Where:
L = Via length (50μm per layer)
k = Ti thermal conductivity (21.9 W/m·K)
A = Via cross-section (10μm²)
N_layers = Number of stacked layers
Typical values:
1 Layer: Rth ≈ 0.23 K/W per via
10 Layers: Rth ≈ 2.3 K/W per via
100 Layers: Rth ≈ 23 K/W per via
Higher Rth increases junction temperature and limits clock frequency. Pressure control can modulate via contact resistance.
D Value Calculation
Each layer computes a D value representing diffusion/dispersion:
OUT Σ aggregates all active photon pulses across layers. IN pulse injects 100 units. O1 readout samples current OUT state. 10kHz clock drives synchronous pulse propagation through vias.
Controls
Build 10x10x10: Initializes base 3D grid of 1000 cores
Stack Buttons: Adds layer stacks to reach 1K or 10K cores
IN Pulse: Injects optical signal into layer 0
10kHz Clock: Enables continuous pulse propagation
O1: Triggers readout of OUT Σ aggregate
Pressure: Modulates via resistance and D calculation (0-10 GPa)